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A low-cost poly-sidewall erase HIMOSTM technology for 130-90nm embedded flash memories

Date

2004
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dc.contributor.authorVan Houdt, Jan
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorWellekens, Dirk
dc.contributor.authorDe Vos, Joeri
dc.contributor.authorHendrickx, Paul
dc.contributor.authorTsouhlarakis, Jorgo
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorWellekens, Dirk
dc.contributor.imecauthorDe Vos, Joeri
dc.contributor.imecauthorHendrickx, Paul
dc.contributor.imecauthorTsouhlarakis, Jorgo
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.contributor.orcidimecDe Vos, Joeri::0000-0002-9332-9336
dc.date.accessioned2021-10-15T17:05:37Z
dc.date.available2021-10-15T17:05:37Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9763
dc.source.conference20th IEEE Non-Volatile Semiconductor Memory Workshop - NVSMW
dc.source.conferencedate22/08/2004
dc.source.conferencelocationMonterey, CA USA
dc.title

A low-cost poly-sidewall erase HIMOSTM technology for 130-90nm embedded flash memories

dc.typeOral presentation
dspace.entity.typePublication
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