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Adsorption and desorption of hydrogen on Si(100) in H2 or Ar heat treatment

Date

2010
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dc.contributor.authorUto, Atsushi
dc.contributor.authorSakuraba, Masao
dc.contributor.authorCaymax, Matty
dc.contributor.authorMurota, Junichi
dc.contributor.imecauthorCaymax, Matty
dc.date.accessioned2021-10-18T22:36:57Z
dc.date.available2021-10-18T22:36:57Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18121
dc.source.beginpage25
dc.source.conference5th International Workshop on New Group IV Semiconductor Nanoelectronics
dc.source.conferencedate29/01/2010
dc.source.conferencelocationSendai Japan
dc.source.endpage26
dc.title

Adsorption and desorption of hydrogen on Si(100) in H2 or Ar heat treatment

dc.typeMeeting abstract
dspace.entity.typePublication
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