Publication:

Wet-Chemical Etching of Metals for Advanced Semiconductor Technology Nodes: Cu Recess Etching and Electrochemistry of Nanopatterned Metal Electrodes

Date

2025-MAR 13
Journal article
https://doi.org/10.1002/adem.202402250
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dc.contributor.authorPhilipsen, Harold
dc.contributor.authorPasquali, Mattia
dc.contributor.authorGeraerts, Niel
dc.contributor.authorArmini, Silvia
dc.contributor.imecauthorPhilipsen, Harold
dc.contributor.imecauthorPasquali, Mattia
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecPhilipsen, Harold::0000-0002-5029-1104
dc.contributor.orcidimecPasquali, Mattia::0000-0002-1309-1082
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.accessioned2025-03-21T05:43:23Z
dc.date.available2025-03-21T05:43:23Z
dc.date.issued2025-MAR 13
dc.identifier.doi10.1002/adem.202402250
dc.identifier.issn1438-1656
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45427
dc.publisherWILEY-V C H VERLAG GMBH
dc.source.journalADVANCED ENGINEERING MATERIALS
dc.source.numberofpages13
dc.subject.keywordsBIMETALLIC CORROSION
dc.subject.keywordsCOPPER
dc.subject.keywordsNANOELECTRODES
dc.subject.keywordsRESISTIVITY
dc.subject.keywordsRUTHENIUM
dc.subject.keywordsCHEMISTRY
dc.subject.keywordsARRAYS
dc.title

Wet-Chemical Etching of Metals for Advanced Semiconductor Technology Nodes: Cu Recess Etching and Electrochemistry of Nanopatterned Metal Electrodes

dc.typeJournal article
dspace.entity.typePublication
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