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Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layers
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Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layers
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Date
2007-04
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Cho, Moon Ju
;
Degraeve, Robin
;
Pourtois, Geoffrey
;
Delabie, Annelies
;
Ragnarsson, Lars-Ake
;
Kauerauf, Thomas
;
Groeseneken, Guido
;
De Gendt, Stefan
;
Heyns, Marc
;
Hwang, cheol seong
Journal
IEEE Trans. Electron Devices
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1839
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Acq. date: 2025-12-10
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Metrics
Views
1839
since deposited on 2021-10-16
3
last month
3
last week
Acq. date: 2025-12-10
Citations