Publication:

Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layers

Date

2007-04

Journal article

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Author(s)

;

Degraeve, Robin

;

Pourtois, Geoffrey

;

Delabie, Annelies

;

Ragnarsson, Lars-Ake

;

Kauerauf, Thomas

;

Groeseneken, Guido

;

De Gendt, Stefan

;

;

Hwang, cheol seong

Journal

IEEE Trans. Electron Devices

Statistics

1839 since deposited on 2021-10-16

Acq. date: 2026-02-24