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Modelling the influence of pad bending on the planarization performance during CMP
Publication:
Modelling the influence of pad bending on the planarization performance during CMP
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Date
1999
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Grillaert, Joost
;
Meuris, Marc
;
Vrancken, Evi
;
Devriendt, Katia
;
Fyen, Wim
;
Heyns, Marc
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1935
since deposited on 2021-10-06
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last month
1
last week
Acq. date: 2025-12-15
Citations
Metrics
Views
1935
since deposited on 2021-10-06
2
last month
1
last week
Acq. date: 2025-12-15
Citations