Publication:

Probabilistic Process Window: A new approach to focus-exposure analysis

Date

2022

Proceedings Paper

https://doi.org/10.1117/12.2614445

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Author(s)

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Yannuzzi, Jonathan

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;

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De Simone, Danilo

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Weldeslassie, Ataklti

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Vandenbroeck, Nadia

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Foubert, Philippe

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Beral, Christophe

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Charley, Anne-Laure

Journal

Proceedings of SPIE

Metrics

1463 since deposited on 2022-09-08

Acq. date: 2025-12-12