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Plasma induced low-k modification and its impact on reliability

Date

2007
Journal article
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dc.contributor.authorTokei, Zsolt
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorCiofi, Ivan
dc.contributor.authorLi, Yunlong
dc.contributor.authorUrbanowicz, Adam
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorLi, Yunlong
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.date.accessioned2021-10-16T20:11:22Z
dc.date.available2021-10-16T20:11:22Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12978
dc.source.beginpage110
dc.source.endpage115
dc.source.issue03_03
dc.source.journalSemiconductor Fabtech
dc.source.volumeFT35
dc.title

Plasma induced low-k modification and its impact on reliability

dc.typeJournal article
dspace.entity.typePublication
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