Publication:

Characterization of overlay mark fidelity

Date

2003
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorAdel, M.
dc.contributor.authorGhinovker, M.
dc.contributor.authorPoplawski, J.M.
dc.contributor.authorKassel, E.
dc.contributor.authorIzikson, P.
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLeray, Philippe
dc.contributor.authorLaidler, David
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.accessioned2021-10-15T03:58:34Z
dc.date.available2021-10-15T03:58:34Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7118
dc.source.beginpage437
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVII
dc.source.conferencedate24/02/2003
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage444
dc.title

Characterization of overlay mark fidelity

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
7322.pdf
Size:
823.87 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions