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De-process and physical characterization of HfO2 based resistive memory as studied by C-AFM
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De-process and physical characterization of HfO2 based resistive memory as studied by C-AFM
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Date
2012
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25031.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Celano, Umberto
;
Chen, Yangyin
;
Wouters, Dirk
;
Jurczak, Gosia
;
Vandervorst, Wilfried
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Abstract
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1930
since deposited on 2021-10-20
Acq. date: 2025-12-12
Citations
Metrics
Views
1930
since deposited on 2021-10-20
Acq. date: 2025-12-12
Citations