Publication:
The integration of low k hydrogen silsesquioxanes (HSQ) in sub 0.35µm processes
Date
| dc.contributor.author | Meynan, H. | |
| dc.contributor.author | Uttech, R. | |
| dc.contributor.author | Gao, Teng | |
| dc.contributor.author | Van Hove, Marleen | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-10-01T08:30:18Z | |
| dc.date.available | 2021-10-01T08:30:18Z | |
| dc.date.issued | 1998 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2764 | |
| dc.source.conference | 3rd International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing and Reliability Issues; | |
| dc.source.conferencelocation | ||
| dc.title | The integration of low k hydrogen silsesquioxanes (HSQ) in sub 0.35µm processes | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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