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Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
Publication:
Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
Date
2002
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kim, Young-Chang
;
Vandenberghe, Geert
;
Verhaegen, Staf
;
Ronse, Kurt
Journal
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1965
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1965
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations