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Conference contributions
High-k dielectrics and metal gates for future generation memory devices
Publication:
High-k dielectrics and metal gates for future generation memory devices
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Date
2009
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19477.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kittl, Jorge
;
Opsomer, Karl
;
Popovici, Mihaela Ioana
;
Menou, Nicolas
;
Kaczer, Ben
;
Wang, Xin Peng
;
Adelmann, Christoph
;
Pawlak, Malgorzata
;
Tomida, Kazuyuki
;
Rothschild, Aude
;
Govoreanu, Bogdan
;
Degraeve, Robin
;
Schaekers, Marc
;
Zahid, Mohammed
;
Delabie, Annelies
;
Meersschaut, Johan
;
Polspoel, W.
;
Clima, Sergiu
;
Pourtois, Geoffrey
;
Detavernier, C.
;
Knaepen, W.
;
Afanasiev, Valeri
;
Blomberg, T.
;
Pierreux, Dieter
;
Swerts, Johan
;
Maes, Jan
;
Manger, D.
;
Vandervorst, Wilfried
;
Conard, Thierry
;
Franquet, Alexis
;
Favia, Paola
;
Bender, Hugo
;
Brijs, Bert
;
Van Elshocht, Sven
;
Jurczak, Gosia
;
Van Houdt, Jan
;
Wouters, Dirk
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2001
since deposited on 2021-10-17
Acq. date: 2026-01-08
Citations
Metrics
Views
2001
since deposited on 2021-10-17
Acq. date: 2026-01-08
Citations