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Assessing the resolution limits of scanning spreading resistance microscopy and scanning capacitance microscopy

Date

2003
Proceedings Paper
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dc.contributor.authorEyben, Pierre
dc.contributor.authorDuhayon, Natasja
dc.contributor.authorAlvarez, David
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-15T04:39:44Z
dc.date.available2021-10-15T04:39:44Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7563
dc.source.beginpage215
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
dc.source.endpage226
dc.title

Assessing the resolution limits of scanning spreading resistance microscopy and scanning capacitance microscopy

dc.typeProceedings paper
dspace.entity.typePublication
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