Publication:

A comparison of spike, flash, SPER and laser annealing for 45nm CMOS

Date

2003
Proceedings Paper
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dc.contributor.authorLindsay, Richard
dc.contributor.authorPawlak, Bartek
dc.contributor.authorKittl, Jorge
dc.contributor.authorHenson, Kirklen
dc.contributor.authorTorregiani, Cristina
dc.contributor.authorGiangrandi, Simone
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMayur, A.
dc.contributor.authorRoss, J.
dc.contributor.authorMcCoy, S.
dc.contributor.authorGelpey, J.
dc.contributor.authorElliott, K.
dc.contributor.authorPagès, Xavier
dc.contributor.authorSatta, Alessandra
dc.contributor.authorLauwers, Anne
dc.contributor.authorStolk, P.
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T05:24:27Z
dc.date.available2021-10-15T05:24:27Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7807
dc.source.beginpage261
dc.source.conferenceCMOS Front-End Materials and Process Technology
dc.source.conferencedate21/04/2003
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage266
dc.title

A comparison of spike, flash, SPER and laser annealing for 45nm CMOS

dc.typeProceedings paper
dspace.entity.typePublication
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