Publication:
Lithography simulation with aerial image - variable threshold resist model
Date
| dc.contributor.author | Randall, John | |
| dc.contributor.author | Gangala, Hareen K | |
| dc.contributor.author | Tritchkov, Alexander | |
| dc.date.accessioned | 2021-10-14T11:35:07Z | |
| dc.date.available | 2021-10-14T11:35:07Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3769 | |
| dc.source.beginpage | 59 | |
| dc.source.endpage | 63 | |
| dc.source.issue | 1_4 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 46 | |
| dc.title | Lithography simulation with aerial image - variable threshold resist model | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |