Publication:
OPC Model Accuracy of Dry Resist Readiness for 0.55NA EUVL by using Low-n Bright Field Mask
| dc.contributor.author | Xu, Dongbo | |
| dc.contributor.author | Gillijns, Werner | |
| dc.contributor.author | Jambaldinni, Shruti | |
| dc.contributor.author | Hwang, Soobin | |
| dc.contributor.author | De Silva, Anuja | |
| dc.contributor.author | Fenger, Germain | |
| dc.contributor.imecauthor | Gillijns, Werner | |
| dc.contributor.imecauthor | Hwang, Soobin | |
| dc.contributor.orcidimec | Gillijns, Werner::0000-0002-2430-7360 | |
| dc.contributor.orcidimec | Hwang, Soobin::0009-0009-9504-1852 | |
| dc.date.accessioned | 2025-07-31T04:00:01Z | |
| dc.date.available | 2025-07-31T04:00:01Z | |
| dc.date.issued | 2025 | |
| dc.description.wosFundingText | This work is partially founded by the European Union by 10ACE (Project: 101139972 - 10ACe - HORIZON-KDT-JU-2023-1-IA). Views and opinions expressed are however those of the author(s) only and do not necessarily reflect those of the European Union or the Chips Joint Undertaking. Neither the European Union nor the granting authority can be held responsible for them. | |
| dc.identifier.doi | 10.1117/12.3051855 | |
| dc.identifier.eisbn | 978-1-5106-8637-3 | |
| dc.identifier.isbn | 978-1-5106-8636-6 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45984 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.conference | 2025 Conference on DTCO and Computational Patterning | |
| dc.source.conferencedate | FEB 25-28, 2025 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.numberofpages | 11 | |
| dc.source.volume | 13425 | |
| dc.title | OPC Model Accuracy of Dry Resist Readiness for 0.55NA EUVL by using Low-n Bright Field Mask | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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