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Scanning spreading resistance microscopy and spectroscopy for routine and quantitative 2D-carrier profiling

Date

2001
Proceedings Paper
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dc.contributor.authorEyben, Pierre
dc.contributor.authorXu, Mingwei
dc.contributor.authorDuhayon, Natasja
dc.contributor.authorClarysse, Trudo
dc.contributor.authorCallewaert, Sven
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorDuhayon, Natasja
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-14T16:55:28Z
dc.date.available2021-10-14T16:55:28Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5288
dc.source.beginpage182
dc.source.conference6th Int. Workshop on Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - USJ
dc.source.conferencedate22/04/2001
dc.source.conferencelocationNapa, CA USA
dc.source.endpage191
dc.title

Scanning spreading resistance microscopy and spectroscopy for routine and quantitative 2D-carrier profiling

dc.typeProceedings paper
dspace.entity.typePublication
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