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Strontium doped hafnium oxide thin films: wide process window for ferroelectric memories
Publication:
Strontium doped hafnium oxide thin films: wide process window for ferroelectric memories
Date
2013
Proceedings Paper
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27020.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Schenk, Tony
;
Mueller, S.
;
Schroeder, Uwe
;
Materlik, R.
;
Kersch, A.
;
Popovici, Mihaela Ioana
;
Adelmann, Christoph
;
Van Elshocht, Sven
;
Mikolajick, T.
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1891
since deposited on 2021-10-21
Acq. date: 2025-10-27
Citations
Metrics
Views
1891
since deposited on 2021-10-21
Acq. date: 2025-10-27
Citations