Publication:
Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtualsource.department | dac3c57c-1540-412d-83c7-8d2e3df06bc8 | |
| cris.virtualsource.orcid | dac3c57c-1540-412d-83c7-8d2e3df06bc8 | |
| dc.contributor.author | Dhagat, Parul | |
| dc.contributor.author | Leitao, Sofia | |
| dc.contributor.author | Torres, Nadia Daniela Rivera | |
| dc.contributor.author | Schiffelers, Guido | |
| dc.contributor.author | Rio, David | |
| dc.contributor.author | Tabery, Cyrus | |
| dc.date.accessioned | 2025-05-11T05:43:41Z | |
| dc.date.available | 2025-05-11T05:43:41Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1117/12.3035360 | |
| dc.identifier.eisbn | 978-1-5106-8156-9 | |
| dc.identifier.isbn | 978-1-5106-8155-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45648 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.conference | 2024 International Conference on Extreme Ultraviolet Lithography | |
| dc.source.conferencedate | 2024-09-29 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 9 | |
| dc.title | Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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