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Protective films formed by RIE of Co and Ti silicides and ways of their removal
Publication:
Protective films formed by RIE of Co and Ti silicides and ways of their removal
Date
1996
Proceedings Paper
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1049.pdf
167.86 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Baklanov, Mikhaïl
;
Vanhaelemeersch, Serge
;
Kim, Young-Chang
;
Storm, Wolfgang
;
Vandervorst, Wilfried
;
Maex, Karen
Journal
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1980
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Views
1980
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations