Publication:

Recent progress in advanced in-line metrology for high-mobility semiconductors

Date

2015
Proceedings Paper
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dc.contributor.authorSchulze, Andreas
dc.contributor.authorLoo, Roger
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorGachet, David
dc.contributor.authorBerney, Jean
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.date.accessioned2021-10-22T22:41:09Z
dc.date.available2021-10-22T22:41:09Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25880
dc.identifier.urlhttp://www.nist.gov/pml/div683/conference/2015_presentations.cfm
dc.source.beginpage85
dc.source.conferenceFrontiers of Characterization and Metrology for Nanoelectronics - FCMN
dc.source.conferencedate14/04/2015
dc.source.conferencelocationDresden Germany
dc.source.endpage87
dc.title

Recent progress in advanced in-line metrology for high-mobility semiconductors

dc.typeProceedings paper
dspace.entity.typePublication
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