Publication:

Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology

Date

2023
Proceedings Paper
https://doi.org/10.1117/12.2658501
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dc.contributor.authorCiesielski, Richard
dc.contributor.authorLohr, Leonhard M.
dc.contributor.authorMertens, Hans
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorde Ruyter, Rudi
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorHoenicke, Philipp
dc.contributor.authorAbbasirad, Najmeh
dc.contributor.authorSoltwisch, Victor
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorde Ruyter, Rudi
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.contributor.orcidimecDe Ruyter, Rudi::0000-0002-8145-288X
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecMertens, Hans::0000-0002-3392-6892
dc.date.accessioned2024-04-11T10:17:28Z
dc.date.available2023-07-28T17:39:56Z
dc.date.available2024-04-11T10:17:28Z
dc.date.issued2023
dc.description.wosFundingTextThe authors acknowledge that this project has received funding from the Electronic Component Systems for European Leadership Joint Undertaking under grant agreement 826589 - MADEin4 and grand agreement 875999 - IT2. This Joint Undertaking receives support from the European Union's Horizon 2020 research and innovation program alongside Netherlands, France, Belgium, Germany, Czech Republic, Austria, Hungary and Israel.
dc.identifier.doi10.1117/12.2658501
dc.identifier.eisbn978-1-5106-6100-4
dc.identifier.isbn978-1-5106-6099-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42235
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 124961M
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVII
dc.source.conferencedateFEB 27-MAR 02, 2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages9
dc.source.volume12496
dc.subject.keywordsX-RAY-SCATTERING
dc.subject.keywordsGRATINGS
dc.subject.keywordsSOFT
dc.title

Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology

dc.typeProceedings paper
dspace.entity.typePublication
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