Publication:

Fullfield 27nm CD control and modeling

Date

2010
Proceedings Paper
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dc.contributor.authorHendrickx, Eric
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.authorKlosterman, Ulrich
dc.contributor.authorGao, Weimin
dc.contributor.authorSchmoeller, Thomas
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-18T17:00:35Z
dc.date.available2021-10-18T17:00:35Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17248
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate17/10/2010
dc.source.conferencelocationKobe Japan
dc.title

Fullfield 27nm CD control and modeling

dc.typeProceedings paper
dspace.entity.typePublication
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