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Resist surface investigations for reduction of line-edge-roughness in top surface imaging technology
Publication:
Resist surface investigations for reduction of line-edge-roughness in top surface imaging technology
Date
1999
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sugihara, Takashi
;
Van Roey, Frieda
;
Goethals, Mieke
;
Ronse, Kurt
;
Van den hove, Luc
Journal
Microelectronic Engineering
Abstract
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1
since deposited on 2021-10-14
Acq. date: 2025-10-25
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1899
since deposited on 2021-10-14
404
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations