Publication:

Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists

Date

2012
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorPerera, Rupert c.
dc.contributor.authorPollentier, Ivan
dc.contributor.authorUnderwood, James H.
dc.contributor.authorHouser, David C.
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-20T14:26:20Z
dc.date.available2021-10-20T14:26:20Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21282
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
dc.title

Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists

dc.typeOral presentation
dspace.entity.typePublication
Files

Original bundle

Name:
24727.pdf
Size:
2.8 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Presentations