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Reaction of Ni and Si0.8Ge0.2: phase formation and thermal stability

Date

2004-11
Journal article
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dc.contributor.authorChamirian, Oxana
dc.contributor.authorLauwers, Anne
dc.contributor.authorKittl, Jorge
dc.contributor.authorVan Dal, Mark
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-15T12:50:29Z
dc.date.available2021-10-15T12:50:29Z
dc.date.issued2004-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8666
dc.source.beginpage297
dc.source.endpage302
dc.source.issue1_4
dc.source.journalMicroelectronic Engineering
dc.source.volume76
dc.title

Reaction of Ni and Si0.8Ge0.2: phase formation and thermal stability

dc.typeJournal article
dspace.entity.typePublication
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