Publication:

Reticle enhancement techniques toward iN7 metal2

Date

2017
Proceedings Paper
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dc.contributor.authorGillijns, Werner
dc.contributor.authorTan, Ling Ee
dc.contributor.authorBlanco, Victor
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorGallagher, Emily
dc.contributor.authorMcIntyre, Greg
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.accessioned2021-10-24T05:05:08Z
dc.date.available2021-10-24T05:05:08Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28399
dc.identifier.urlhttps://doi.org/10.1117/12.2258003
dc.source.beginpage1014314
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate27/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Reticle enhancement techniques toward iN7 metal2

dc.typeProceedings paper
dspace.entity.typePublication
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