Publication:

New approach to optical proximity correction

Date

1998
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorRosenbusch, A.
dc.contributor.authorHourd, A.
dc.contributor.authorJuffermans, C.
dc.contributor.authorKirsch, H.
dc.contributor.authorLalanne, F.
dc.contributor.authorMaurer, W.
dc.contributor.authorRomeo, C.
dc.contributor.authorRonse, Kurt
dc.contributor.authorSchiavone, P.
dc.contributor.authorSimecek, M.
dc.contributor.authorToublan, O.
dc.contributor.authorWatson, J.
dc.contributor.authorZiegler, W.
dc.contributor.authorZimmermann, R.
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-01T08:49:24Z
dc.date.available2021-10-01T08:49:24Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2914
dc.source.beginpage585
dc.source.conference18th Annual Bacus Symposium on Photomask Technology and Management
dc.source.conferencedate16/09/1998
dc.source.conferencelocationRedwood City, CA USA
dc.source.endpage593
dc.title

New approach to optical proximity correction

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
18116.pdf
Size:
835.04 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions