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On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition

Date

2005
Proceedings Paper
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dc.contributor.authorOnsia, Bart
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorDelabie, Annelies
dc.contributor.authorGottschalk, C.
dc.contributor.authorGreen, M.
dc.contributor.authorHeyns, Marc
dc.contributor.authorLin, S.
dc.contributor.authorMertens, Paul
dc.contributor.authorTsai, Wilman
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-16T03:47:04Z
dc.date.available2021-10-16T03:47:04Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10958
dc.source.beginpage19
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
dc.source.endpage22
dc.title

On the application of a thin ozone based wet chemical oxide as an interface for ALD high-k deposition

dc.typeProceedings paper
dspace.entity.typePublication
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