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Limitation of EUV single exposure on DRAM applications: learning and challenges

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dc.contributor.authorLiu, Shih-hsiang
dc.contributor.authorDardani, Zoi
dc.contributor.authorZuurbier, Nadia
dc.contributor.authorDhagat, Parul
dc.contributor.authorWang, Erik
dc.contributor.authorFallica, Roberto
dc.contributor.imecauthorFallica, Roberto
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.date.accessioned2022-05-03T07:58:04Z
dc.date.available2022-05-02T16:50:58Z
dc.date.available2022-05-03T07:58:04Z
dc.date.issued2022-06-15
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39726
dc.source.conferenceASML Technology Conference 2022
dc.source.conferencedate2022-06-15
dc.source.conferencelocationASML
dc.subject.disciplineEngineering
dc.title

Limitation of EUV single exposure on DRAM applications: learning and challenges

dc.typeOral presentation
dspace.entity.typePublication
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