Publication:

Formation of deep submicrometer cobalt silicated poly gate using bilayer processes

Date

1995
Proceedings Paper
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dc.contributor.authorWang, Qingfeng
dc.contributor.authorLauwers, Anne
dc.contributor.authorDeweerdt, Bruno
dc.contributor.authorVerbeeck, Rita
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorDeweerdt, Bruno
dc.contributor.imecauthorVerbeeck, Rita
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-09-29T13:25:12Z
dc.date.available2021-09-29T13:25:12Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1006
dc.source.beginpage519
dc.source.conferenceProceedings of the 5th International Symposium on Ultra Large Scale Integration Science and Technology
dc.source.conferencedate21/05/1995
dc.source.conferencelocationReno, NV USA
dc.source.endpage524
dc.title

Formation of deep submicrometer cobalt silicated poly gate using bilayer processes

dc.typeProceedings paper
dspace.entity.typePublication
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