Publication:

Carrier profiling of a cross-sectioned silicon nanowire by scanning spreading resistance microscopy

Date

2007
Proceedings Paper
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dc.contributor.authorHantschel, Thomas
dc.contributor.authorSchulz, Volker
dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorEyben, Pierre
dc.contributor.authorVerhulst, Anne
dc.contributor.authorSchmidt, Volker
dc.contributor.authorVereecken, Philippe
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVerhulst, Anne
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecVerhulst, Anne::0000-0002-3742-9017
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.date.accessioned2021-10-16T16:27:36Z
dc.date.available2021-10-16T16:27:36Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12244
dc.source.conferenceInternational Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling
dc.source.conferencedate6/05/2007
dc.source.conferencelocationNapa, CA USA
dc.title

Carrier profiling of a cross-sectioned silicon nanowire by scanning spreading resistance microscopy

dc.typeProceedings paper
dspace.entity.typePublication
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