Publication:

Feasibility study of grapho-epitaxy DSA for complementing EUV lithography beyond N10

Date

2015
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLin, Chenxi
dc.contributor.authorZou, Yi
dc.contributor.authorAmbesi, Davide
dc.contributor.authorDruzhinina, Tamara
dc.contributor.authorWuister, Sander
dc.contributor.authorKarageorgos, Ioannis
dc.contributor.authorRyckaert, Julien
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-22T20:36:55Z
dc.date.available2021-10-22T20:36:55Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25563
dc.source.conference1st International Symposium on DSA
dc.source.conferencedate26/10/2015
dc.source.conferencelocationLeuven Belgium
dc.title

Feasibility study of grapho-epitaxy DSA for complementing EUV lithography beyond N10

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions