Publication:

Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson HighlandsTM chamber

Date

2003
Proceedings Paper
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dc.contributor.authorMannaert, Geert
dc.contributor.authorVan Cauwenberghe, Marc
dc.contributor.authorSchmidt, M.O.
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorHendrickx, Dirk
dc.contributor.authorStucchi, Michele
dc.contributor.authorConard, Thierry
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorBoullart, Werner
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVan Cauwenberghe, Marc
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorHendrickx, Dirk
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-15T05:35:16Z
dc.date.available2021-10-15T05:35:16Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7858
dc.source.beginpage267
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
dc.source.endpage271
dc.title

Resist strip and Cu diffusion barrier etch in Cu BEOL integration schemes in a Mattson HighlandsTM chamber

dc.typeProceedings paper
dspace.entity.typePublication
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