Publication:
Removal of post-etch 193 nm photoresist in porous low-k dielectric patterning using UV irradiation and wet chemistries
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1904 since deposited on 2021-10-17
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Acq. date: 2026-08-03
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1904 since deposited on 2021-10-17
2last month
2last week
Acq. date: 2026-08-03
Citations