Publication:

Comparison of ATHENA and TTL alignment capability in product wafers

Date

2002
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorOpitz, Juliann
dc.contributor.authorLaidler, David
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.accessioned2021-10-14T22:39:26Z
dc.date.available2021-10-14T22:39:26Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6680
dc.source.beginpage852
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVI
dc.source.conferencedate4/03/2002
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage862
dc.title

Comparison of ATHENA and TTL alignment capability in product wafers

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
6198.pdf
Size:
983.93 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions