Publication:
Integrated cleaning and handling automation of NXE3100 reticles
Date
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Waehler, Tobias | |
| dc.contributor.author | Baudemprez, Bart | |
| dc.contributor.author | Dietze, Uwe | |
| dc.contributor.author | Dress, Peter | |
| dc.contributor.author | Brux, Oliver | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.imecauthor | Baudemprez, Bart | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-20T11:55:56Z | |
| dc.date.available | 2021-10-20T11:55:56Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20874 | |
| dc.source.beginpage | 83520U | |
| dc.source.conference | 28th European Mask and Lithography Conference | |
| dc.source.conferencedate | 17/01/2012 | |
| dc.source.conferencelocation | Dresden Germany | |
| dc.title | Integrated cleaning and handling automation of NXE3100 reticles | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |