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Conference contributions
Dry etch challenges in a 20 nm half-pitch single damascene spacer-defined patterning scheme
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Dry etch challenges in a 20 nm half-pitch single damascene spacer-defined patterning scheme
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Date
2010
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kunnen, Eddy
;
Versluijs, Janko
;
Alaerts, Wilfried
;
Siew, Yong Kong
;
Struyf, Herbert
;
Beyer, Gerald
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1927
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Acq. date: 2025-12-15
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Metrics
Views
1927
since deposited on 2021-10-18
1
last month
Acq. date: 2025-12-15
Citations