Publication:
Electrostatic potential perturbation at the polycrystalline Si/HfO2 interface
Date
| dc.contributor.author | Afanasiev, Valeri | |
| dc.contributor.author | Stesmans, Andre | |
| dc.contributor.author | Pantisano, Luigi | |
| dc.contributor.author | P. J. Chen, | |
| dc.contributor.imecauthor | Afanasiev, Valeri | |
| dc.contributor.imecauthor | Stesmans, Andre | |
| dc.date.accessioned | 2021-10-16T00:42:28Z | |
| dc.date.available | 2021-10-16T00:42:28Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10003 | |
| dc.source.beginpage | 72107 | |
| dc.source.issue | 7 | |
| dc.source.journal | Applied Physics Letters | |
| dc.source.volume | 86 | |
| dc.title | Electrostatic potential perturbation at the polycrystalline Si/HfO2 interface | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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