Publication:
Massive metrology for process development and monitoring applications
Date
| dc.contributor.author | Sah, Kaushik | |
| dc.contributor.author | Das, Sayantan | |
| dc.contributor.author | Li, S. | |
| dc.contributor.author | Beral, C. | |
| dc.contributor.author | Cross, A. | |
| dc.contributor.author | Halder, Sandip | |
| dc.contributor.imecauthor | Sah, Kaushik | |
| dc.contributor.imecauthor | Das, Sayantan | |
| dc.contributor.imecauthor | Halder, Sandip | |
| dc.contributor.orcidimec | Das, Sayantan::0000-0002-3031-0726 | |
| dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
| dc.date.accessioned | 2021-10-29T03:24:42Z | |
| dc.date.available | 2021-10-29T03:24:42Z | |
| dc.date.issued | 2020 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/35871 | |
| dc.identifier.url | https://doi.org/10.1117/12.2553092 | |
| dc.source.beginpage | 1132528 | |
| dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXXIV | |
| dc.source.conferencedate | 23/03/2020 | |
| dc.source.conferencelocation | San Jose,CA USA | |
| dc.title | Massive metrology for process development and monitoring applications | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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