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The future of high-k on pure germanium and its importance for Ge CMOS

Date

2004
Proceedings Paper
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dc.contributor.authorMeuris, Marc
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKubicek, Stefan
dc.contributor.authorVerheyen, Peter
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorWinderickx, Gillis
dc.contributor.authorVan Moorhem, Els
dc.contributor.authorPurunen, Riikka
dc.contributor.authorBrijs, Bert
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorZhao, Chao
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorSchram, Tom
dc.contributor.authorChiarella, Thomas
dc.contributor.authorOnsia, Bart
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorWinderickx, Gillis
dc.contributor.imecauthorVan Moorhem, Els
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.date.accessioned2021-10-15T14:53:28Z
dc.date.available2021-10-15T14:53:28Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9301
dc.source.beginpage91
dc.source.conferenceProgram and Abstracts 2nd International SiGe Technology and Device Meeting - ISDTM
dc.source.conferencedate16/05/2004
dc.source.conferencelocationFrankfurt/Oder Germany
dc.source.endpage92
dc.title

The future of high-k on pure germanium and its importance for Ge CMOS

dc.typeProceedings paper
dspace.entity.typePublication
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