Publication:
Quantification of high-K nanolayers for semiconductor applications using synchrotron radiation and calibrated instrumentation
Date
| dc.contributor.author | Mueller, Matthias | |
| dc.contributor.author | Hoenicke, Philipp | |
| dc.contributor.author | Detlefs, Blanka | |
| dc.contributor.author | Fleischmann, Claudia | |
| dc.contributor.author | Vandervorst, Wilfried | |
| dc.contributor.author | Beckhoff, Burkhard | |
| dc.contributor.imecauthor | Fleischmann, Claudia | |
| dc.contributor.imecauthor | Vandervorst, Wilfried | |
| dc.contributor.orcidimec | Fleischmann, Claudia::0000-0003-1531-6916 | |
| dc.date.accessioned | 2021-10-22T04:00:38Z | |
| dc.date.available | 2021-10-22T04:00:38Z | |
| dc.date.issued | 2014 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/24283 | |
| dc.source.beginpage | na | |
| dc.source.conference | NanotechItaly | |
| dc.source.conferencedate | 26/11/2014 | |
| dc.source.conferencelocation | Venice Italy | |
| dc.title | Quantification of high-K nanolayers for semiconductor applications using synchrotron radiation and calibrated instrumentation | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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