Publication:

Intrinsic tailing of LRS/HRS distributions in amorphous HfO and TaO based RRAM

Date

2015
Journal article
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dc.contributor.authorClima, Sergiu
dc.contributor.authorChen, Yangyin
dc.contributor.authorFantini, Andrea
dc.contributor.authorGoux, Ludovic
dc.contributor.authorDegraeve, Robin
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorJurczak, Gosia
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorChen, Yangyin
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.date.accessioned2021-10-22T18:43:16Z
dc.date.available2021-10-22T18:43:16Z
dc.date.issued2015
dc.identifier.issn0741-3106
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25089
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7131462
dc.source.beginpage769
dc.source.endpage771
dc.source.issue8
dc.source.journalIEEE Electron Device Letters
dc.source.volume36
dc.title

Intrinsic tailing of LRS/HRS distributions in amorphous HfO and TaO based RRAM

dc.typeJournal article
dspace.entity.typePublication
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