Publication:

Amorphous silicon photonic crystals made with 193nm lithography

Date

2009
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorBogaerts, Wim
dc.contributor.authorDumon, Pieter
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorBaets, Roel
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.accessioned2021-10-18T02:50:59Z
dc.date.available2021-10-18T02:50:59Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16194
dc.source.conference8th International Photonic & Electromagnetic Crystal Structures Meeting - PECS VIII
dc.source.conferencedate5/04/2009
dc.source.conferencelocationSydney Australia
dc.title

Amorphous silicon photonic crystals made with 193nm lithography

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
19578.pdf
Size:
215.78 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions