Publication:
Lithography options for the 32nm half pitch node and their implications on resist and material technology
Date
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.author | Wiaux, Vincent | |
| dc.contributor.author | Maenhoudt, Mireille | |
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.imecauthor | Wiaux, Vincent | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-16T16:25:00Z | |
| dc.date.available | 2021-10-16T16:25:00Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12233 | |
| dc.source.beginpage | 68271V | |
| dc.source.conference | Quantum Optics, Optical Data Storage, and Advanced Microlithography | |
| dc.source.conferencedate | 11/11/2007 | |
| dc.source.conferencelocation | Beijing China | |
| dc.title | Lithography options for the 32nm half pitch node and their implications on resist and material technology | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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