Publication:

Resistivity Scaling of Rhodium Nanowires for Advanced Interconnect Applications

Date

2025
Journal article
https://doi.org/10.1021/acsanm.5c02653
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dc.contributor.authorDutta, Shibesh
dc.contributor.authorSankaran, Kiroubanand
dc.contributor.authorSoulie, Jean-Philippe
dc.contributor.authorKundu, Shreya
dc.contributor.authorOpsomer, Karl
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorChen, Linghan
dc.contributor.authorFounta, Valeria
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorvan de Vondel, Joris
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSwerts, Johan
dc.contributor.authorPark, Seongho
dc.contributor.authorTokei, Zsolt
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2026-06-11T14:57:18Z
dc.date.available2026-06-11T14:57:18Z
dc.date.createdwos2025-09-26
dc.date.issued2025
dc.description.wosFundingTextThis work was supported by imec's industrial affiliate program on Nano-Interconnects. V.F. acknowledges the support by a PhD scholarship from the Fonds Wetenschappelijk Onderzoek-Vlaanderen (FWO).
dc.identifier.doi10.1021/acsanm.5c02653
dc.identifier.issn2574-0970
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/59669
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage18240
dc.source.endpage18250
dc.source.issue38
dc.source.journalACS APPLIED NANO MATERIALS
dc.source.numberofpages11
dc.source.volume8
dc.subject.keywordsCHEMICAL-VAPOR-DEPOSITION
dc.subject.keywordsTHIN-FILMS
dc.subject.keywordsPOLYCRYSTALLINE FILMS
dc.subject.keywordsREFLECTION
dc.subject.keywordsGROWTH
dc.subject.keywordsMODEL
dc.title

Resistivity Scaling of Rhodium Nanowires for Advanced Interconnect Applications

dc.typeJournal article
dspace.entity.typePublication
imec.internal.crawledAt2025-10-22
imec.internal.sourcecrawler
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