Publication:

Line edge and width roughness smoothing by plasma treatment

Date

2013
Proceedings Paper
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dc.contributor.authorDe Schepper, Peter
dc.contributor.authorHansen, Terje
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-21T07:10:27Z
dc.date.available2021-10-21T07:10:27Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22217
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1674528
dc.source.beginpage868505
dc.source.conferenceAdvanced Etch Technology for Nanopatterning II
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.title

Line edge and width roughness smoothing by plasma treatment

dc.typeProceedings paper
dspace.entity.typePublication
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