Publication:

Passivation of (100)Ge/GeO2/high-k gate stacks using thermal oxide treatments

Date

2008
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorBellenger, Florence
dc.contributor.authorHoussa, Michel
dc.contributor.authorDelabie, Annelies
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorConard, Thierry
dc.contributor.authorCaymax, Matty
dc.contributor.authorMeuris, Marc
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-17T06:16:34Z
dc.date.available2021-10-17T06:16:34Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13365
dc.source.beginpageG33
dc.source.endpageG38
dc.source.issue2
dc.source.journalJournal of the Electrochemical Society
dc.source.volume155
dc.title

Passivation of (100)Ge/GeO2/high-k gate stacks using thermal oxide treatments

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
15710.pdf
Size:
801.03 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles