Publication:
Machine learning methods for Voltage Contrast yield analysis
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| cris.virtualsource.orcid | 34111beb-7a3a-4530-b662-de0bc5f7d47c | |
| dc.contributor.author | Cerbu, Dorin | |
| dc.contributor.author | Blanco, Victor | |
| dc.contributor.author | Schleicher, Filip | |
| dc.contributor.author | Van de Kerkhove, Jeroen | |
| dc.contributor.author | Leray, Philippe | |
| dc.contributor.author | Kissoon, N. N. | |
| dc.contributor.author | De Poortere, E. P. | |
| dc.contributor.imecauthor | Cerbu, D. | |
| dc.contributor.imecauthor | Carballo, V. M. Blanco | |
| dc.contributor.imecauthor | Schleicher, F. | |
| dc.contributor.imecauthor | van de Kerkhove, J. | |
| dc.contributor.imecauthor | Leray, P. | |
| dc.date.accessioned | 2024-06-15T17:25:53Z | |
| dc.date.available | 2024-06-15T17:25:53Z | |
| dc.date.issued | 2024 | |
| dc.identifier.doi | 10.1117/12.3011142 | |
| dc.identifier.eisbn | 978-1-5106-7217-8 | |
| dc.identifier.isbn | 978-1-5106-7216-1 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/44050 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 129551C | |
| dc.source.conference | Conference on Metrology, Inspection, and Process Control XXXVIII | |
| dc.source.conferencedate | 2024-02-28 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 8 | |
| dc.title | Machine learning methods for Voltage Contrast yield analysis | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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