Publication:

Gate-All-Around nanowire & nanosheet FETs for advanced, ultra-scaled technologies (Keynote)

Date

2020
Proceedings Paper
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dc.contributor.authorVeloso, Anabela
dc.contributor.authorMatagne, Philippe
dc.contributor.authorJang, Doyoung
dc.contributor.authorHuynh-Bao, Trong
dc.contributor.authorVaisman Chasin, Adrian
dc.contributor.authorSimoen, Eddy
dc.contributor.authorEneman, Geert
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorMertens, Hans
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorJang, Doyoung
dc.contributor.imecauthorVaisman Chasin, Adrian
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecVaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-29T07:04:57Z
dc.date.available2021-10-29T07:04:57Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36234
dc.identifier.urlhttps://doi.org/10.1149/09705.0003ecst
dc.source.beginpage3
dc.source.conference237th ECS Meeting - Advanced CMOS-Compatible Semiconductor Devices 19
dc.source.conferencedate10/05/2020
dc.source.conferencelocationBristol UK
dc.source.endpage14
dc.title

Gate-All-Around nanowire & nanosheet FETs for advanced, ultra-scaled technologies (Keynote)

dc.typeProceedings paper
dspace.entity.typePublication
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